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iPLAS
MPCVD System |
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Ø
4”
plasma source
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Manual EH
tuner
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Deposition up
to 4’’ wafers
Ø
6 KW
microwave generator (2.45 GHz)
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Substrate
heated up to 800°C
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Dedicated
for growth of nitrogen doped nanocrystalline diamond.
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1 KW
microwave generator (2.45 GHz)
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Deposition
up to one inch
wafer
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Manual
tuning
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Dedicated
to grow boron doped micro/nano diamond coating
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Pulsed Laser Deposition
System
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Substrate heated up to 650°C
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Multi-target holder system
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Deposition Chamber can be pumped up to 10-7
Torr
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CMS-18
Sputtering System with Load Lock
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3 Sputter
guns (One RF and two DC power supplies)
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Substrate holder for up to 6 inch substrates
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Pneumatic deposition source shutter,
switch activated
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Optional heating and control of
substrate
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Process Gas Inlet/ Pressure
Control
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Carbon Nanotube Growth Facility
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Lindberg
Blue Furnace
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Maximum
Temperature 1200°C
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Programmable Temperature Controller
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Dedicated for Carbon Nanotube Growth
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Sol Gel Deposition System |
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Spinner rotation speed is 10000 rpm
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Hot plate temperature
400°C
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Dedicated for sol-gel deposition for ferroelectric thin films
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Metrology and Characterization (AMRL) |
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Renishaw MicroRaman Spectroscopy |
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Ar ion laser, 514.5 nm
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He-Ne laser, 633 nm
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Semiconductor diode laser, 785 nm
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-70° Centigrade Peltier cooled CCD detector
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XYZ motorized mapping stage
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100 cm-1 cutoff notch filter
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Magnification up to 1000x (x5, x20, x50, x100 objectives)
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Grams 32 spectral analysis software, and geological spectra
database
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8000 cm-1 extended scanning range
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1800 l/mm and 1200 l/mm gratings
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Wavelength Range- 7800-350 cm^-1
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Resolution- 0.5 to 64 cm^-1
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Wavelength accuracy- 0.1 to 1600 cm^-1
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Sealed and desiccated optical unit.
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UV-VIS
Spectrophotometer |
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Optical system: Double beam, single
monochromator
with a 1200 grooves/mm concave grating
and modified
Rowland mount
Spectral bandwidth: 2 nm
Wavelength range: 190 - 1100 nm
Halogen lamp for VIS range (330 - 1100 nm)
Wavelength accuracy: ± 0.5 nm
Photometric accuracy: ± 0.002 Abs (0 - 0.5 Abs)
Detector: Silicon photo-diode (S1337)
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Agilent
4294A Impedance Analyzer & |
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Micro Manipulator 6000 series probe
station Frequency Range 40Hz to
110MHz.
Dedicated to measure the electrical
properties of materials
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PARSTAT2263
Electrochemical Analyzer |
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Potentiostat/Galvanostat/FRA that consists of
hardware which is capable of ±10 V scan
ranges,
200mA current capabilities, and
Electrical measurements up to 1 MHz.
Powered to be operated with an AC/DC
converter, or with a DC power supply for remote/field applications
Modules available :PowerCV , PowerSTEP ,
PowerCORR, PowerPULSE (electroanalytical
software), and PowerSINE |
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Gas Sensor Testing Facility |
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Dedicated
for Toxic gases sensing applications
4-gas inlet valves
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CMP/Tribometer Benchtop Tester |
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Rotational Speeds - 0.1 -
600 rpm, Slider velocity range -
5 - 600 mm/min,
Down force range - 1 - 100 N
(Changeable)
Slurry Flow rate - 30 - 200 ml/min
Wafer Diameter - 2" wafers
Pad diameter - 6" pad coupons
Acoustic emission and Temperature
sensors available
Dedicated to investigate metrology
issues of CMP Processes
Can be used as a Pin-On-Disk to
measure the
tribological properties
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MTS
NanoIndenter XP |
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Maximum applied load is 500
mN
Indenter load resolution of 50 nN
Displacement resolution of <.02 nm
Testworks 4 software is used for
analysis of
collected data
Dedicated to measure mechanical
properties of thin
films using CSM and DSM modes
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Four
Point Bending Tester |
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4-point delaminator with
load actuators Data acquisition
box-SCXI-1000
Computer System with DTSI software
Dedicated to measure adhesion and
fracture properties of thin film coatings |
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