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- Office: ENB 150
- Phone: 974-4101
- Fax:
- E-mail: clbell2@mail.usf.edu
- Research work summary: The purpose of the last semester’s research was to optimize the new Hot Filament Chemical Vapor Deposition (HFCVD) assembly to achieve the highest possible quality diamond films on silicon substrates. Initial depositions were made according to manufacturer’s instructions. Later, variables such as feedstock gas ratios, seeding process, electrode voltage, and deposition time were adjusted to improve film quality, with emphasis on minimizing the films’ graphite content. These later samples were compared via Raman spectroscopy and Atomic Force Microscopy to the initial samples to determine if significant improvement in film quality had in fact been obtained. Careful records were kept regarding the deposition parameters for each specimen, so that later comparisons would reveal the optimal seeding treatments and settings for the machine. As work proceeded and refinements were made, a customized set of procedural guidelines was developed to augment the manufacturer’s manual, incorporating the methods that the semester’s experiments had proven most effective. It is hoped that these refined guidelines will prove useful in further optimizing the HFCVD techniques for alternative substrate materials, culminating in a study of cutting tools coated with microcrystalline versus nanocrystalline diamond films.
With several depositions completed, the focus shifted to sample characterization and comparison. As previously state, two methods were employed to characterize the samples, the first being Raman spectroscopy. The optimization efforts for the HFCVD machine resulted in the successful deposition of an MCD quality film on a silicon substrate, as evidenced by visual inspection of the Raman spectra and the AFM images. The MCD film was obtained with convenient slurry seeding treatment and shorter deposition time. Extending deposition time would likely increase the intensity of the MCD peak in the Raman spectrum and increase film thickness. Documentation of the semester’s proceedings led to the successful compilation of supplemental procedural guidelines, which will serve as a platform for expanded optimization efforts, to include additional substrates such as cutting tools. Additional optimization efforts could also focus on the deposition of NCD films, with an aim to compare the performance of MCD-coated cutting tools to those coated with NCD.
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